BAVARIAN JOINT RESEARCH PROGRAM FOR SURFACE TECHNOLOGY
II.3 Optimization of CVD reactor and process design by numerical simulation for refinement of layer-thickness homogeneity
The present research project is a joint enterprise in which numerical model and simulation software for refinement of layer-thickness homogeneity of semiconductor CVD on large substrates is to be acquired in cooperation with industry. The applied mathematical models are to be verified by means of available reactors. Due to the experience thereby gained a concept for an optimum reactor is to be designed and its qualities are to be checked numerically. Thereof an improvement of growth processes is being expected for practice. For industrial implementation the reduction of costs which results from a change in diameter of the silicon wafers from 200 to 300 mm is of importance.